Extreme UV Lithography: Development of a laser plasma source and multilayer reflective optics

F Bijkerk; LA Shmaenol; E Louis; HJ Voorma; NB Koster; FA van Goor; J van Spijker; EWJM van der Drift; J Romijn; BAC Rousseeuw; T Zijlstra

Extreme UV Lithography: Development of a laser plasma source and multilayer reflective optics

F Bijkerk, LA Shmaenol, E Louis, HJ Voorma, NB Koster, FA van Goor, J van Spijker, EWJM van der Drift, J Romijn, BAC Rousseeuw, T Zijlstra

QN/Kavli Nanolab Delft

Research output: Contribution to journal › Article › Scientific › peer-review

13 Citations (Scopus)

Original language	Undefined/Unknown
Pages (from-to)	183-186
Number of pages	4
Journal	Microelectronic Engineering
Volume	30
Publication status	Published - 1996

Cite this

@article{abfc10b1350345fe8a0d1f4e711c4744,

title = "Extreme UV Lithography: Development of a laser plasma source and multilayer reflective optics",

author = "F Bijkerk and LA Shmaenol and E Louis and HJ Voorma and NB Koster and {van Goor}, FA and {van Spijker}, J and {van der Drift}, EWJM and J Romijn and BAC Rousseeuw and T Zijlstra",

year = "1996",

language = "Undefined/Unknown",

volume = "30",

pages = "183--186",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

}

TY - JOUR

T1 - Extreme UV Lithography: Development of a laser plasma source and multilayer reflective optics

AU - Bijkerk, F

AU - Shmaenol, LA

AU - Louis, E

AU - Voorma, HJ

AU - Koster, NB

AU - van Goor, FA

AU - van Spijker, J

AU - van der Drift, EWJM

AU - Romijn, J

AU - Rousseeuw, BAC

AU - Zijlstra, T

PY - 1996

Y1 - 1996

M3 - Article

SN - 0167-9317

VL - 30

SP - 183

EP - 186

JO - Microelectronic Engineering

JF - Microelectronic Engineering

ER -