Extreme UV Lithography: Development of a laser plasma source and multilayer reflective optics

F Bijkerk, LA Shmaenol, E Louis, HJ Voorma, NB Koster, FA van Goor, J van Spijker, EWJM van der Drift, J Romijn, BAC Rousseeuw, T Zijlstra

Research output: Contribution to journalArticleScientificpeer-review

13 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)183-186
Number of pages4
JournalMicroelectronic Engineering
Volume30
Publication statusPublished - 1996

Cite this

Bijkerk, F., Shmaenol, LA., Louis, E., Voorma, HJ., Koster, NB., van Goor, FA., van Spijker, J., van der Drift, EWJM., Romijn, J., Rousseeuw, BAC., & Zijlstra, T. (1996). Extreme UV Lithography: Development of a laser plasma source and multilayer reflective optics. Microelectronic Engineering, 30, 183-186.