Fabrication and analysis of Exteme Ultra-violet reflection masks with patterned W/C absorber bilayers

HJ Voorma, E Louis, NB Koster, LA Smaenok, F Bijkerk, T Zijlstra, LEM de Groot, EWJM van der Drift, BAC Rousseeuw, J Romijn, J Friedrich

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)293-298
Number of pages6
JournalJournal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume15
Publication statusPublished - 1997

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