Fabrication of 2D photonic crystal waveguides for 1.5 µm in silicon by deep anisotropic dry etching.

T Zijlstra, EWJM van der Drift, MJA de Dood, E Snoeks, A Polman

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

95 Citations (Scopus)
Original languageUndefined/Unknown
Title of host publicationProceedings 43rd Int. Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
EditorsJ Wolfe
Pages2734-2739
Number of pages6
Publication statusPublished - 1999

Keywords

  • ZX Int.klas.verslagjaar < 2002

Cite this

Zijlstra, T., van der Drift, EWJM., de Dood, MJA., Snoeks, E., & Polman, A. (1999). Fabrication of 2D photonic crystal waveguides for 1.5 µm in silicon by deep anisotropic dry etching. In J. Wolfe (Ed.), Proceedings 43rd Int. Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (pp. 2734-2739)