Fabrication of narrow-gap nanostructures using electron-beam induced deposition etch masks

Research output: Contribution to journalArticleScientificpeer-review

7 Citations (Scopus)
Original languageEnglish
Pages (from-to)77-82
JournalMicroelectronic Engineering
Volume153
DOIs
Publication statusPublished - 2016

Bibliographical note

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Keywords

  • masks
  • nanostructures
  • EBID
  • Dry etching

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