Fabrication of narrow-gap nanostructures using electron-beam induced deposition etch masks

    Research output: Contribution to journalArticleScientificpeer-review

    6 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)77-82
    Number of pages6
    JournalMicroelectronic Engineering
    Volume153
    DOIs
    Publication statusPublished - 2016

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