@inproceedings{cec4bee5efb843ecbb410726f23b8d5f,
title = "Fabrication process of Si microlenses for OCT systems",
abstract = "We present Si microlenses fabricated using dry ICP plasma etching of silicon and thermal photoresist reflow. The process is insensitive to thermal reflow time and it can be easily incorporated into fabrication flows for complex optical systems. Using this process, we were able to fabricate microlenses with diameter of 150 μm, radius of curvature of 682 μm and with a surface roughness of only 25 nm.",
keywords = "fabrication, Si microlenses, thermal photoresist reflow",
author = "A. Jovic and G. Pandraud and Kirill Zinoviev and Rubio, {Jose L.} and E Margallo and Lina Sarro",
year = "2016",
doi = "10.1117/12.2227898",
language = "English",
series = "Proceedings of SPIE",
publisher = "SPIE",
number = "9888",
pages = "98880C--1/98888C--10",
editor = "Hugo Thienpont and J{\"u}rgen Mohr and Hans Zappe and Hirochika Nakajima",
booktitle = "Proceedings of SPIE Micro-Optics 2016",
address = "United States",
note = "Micro-Optics 2016 ; Conference date: 03-04-2016 Through 03-04-2016",
}