Fabrication Tolerance Sensitivity in Large-Area Mid-Infrared Metamaterial Absorbers

Mohammadamir Ghaderi; Ehsan Karimi; N. Pelin Ayerden; Reinoud F. Wolffenbuttel

doi:10.3390/proceedings1040328

Fabrication Tolerance Sensitivity in Large-Area Mid-Infrared Metamaterial Absorbers

Mohammadamir Ghaderi, Ehsan Karimi, N. Pelin Ayerden, Reinoud F. Wolffenbuttel

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

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Abstract

Metamaterial absorbers are photonic structures composed of an array of sub-wavelength metallic patterns. Results in literature are usually based on structures of nominal dimensions, despite the significant effect of fabrication tolerances on performance. This research aims to identify the main sources of uncertainty and to investigate their effect, notably that of an irregular surface quality (i.e., roughness) of the thin metallic layer and the lithography related variations in size and shape. The effect of the shape and positioning of the resonance peak was investigated and validated using mid-infrared metamaterial absorbers. This sensitivity analysis is essential to the batch fabrication of metamaterial absorbers for MEMS applications.

Original language	English
Title of host publication	Proceedings of Eurosensors 2017
Pages	1-4
Number of pages	4
DOIs	https://doi.org/10.3390/proceedings1040328
Publication status	Published - 2017
Event	Eurosensors 2017: 31st Conference - Paris, France Duration: 3 Sept 2017 → 6 Sept 2017 Conference number: 31 http://www.eurosensors2017.eu/

Publication series

Name	Proceedings
Publisher	MDPI
Number	4
Volume	1
ISSN (Print)	2504-3900

Conference

Conference	Eurosensors 2017
Country/Territory	France
City	Paris
Period	3/09/17 → 6/09/17
Internet address	http://www.eurosensors2017.eu/

Keywords

metamaterial absorber
mid-infrared
UV lithography
tolerance sensitivity
fabrication

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37855462Final published version, 826 KBLicence: CC BY

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title = "Fabrication Tolerance Sensitivity in Large-Area Mid-Infrared Metamaterial Absorbers",

abstract = "Metamaterial absorbers are photonic structures composed of an array of sub-wavelength metallic patterns. Results in literature are usually based on structures of nominal dimensions, despite the significant effect of fabrication tolerances on performance. This research aims to identify the main sources of uncertainty and to investigate their effect, notably that of an irregular surface quality (i.e., roughness) of the thin metallic layer and the lithography related variations in size and shape. The effect of the shape and positioning of the resonance peak was investigated and validated using mid-infrared metamaterial absorbers. This sensitivity analysis is essential to the batch fabrication of metamaterial absorbers for MEMS applications.",

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N1 - Conference code: 31

PY - 2017

Y1 - 2017

N2 - Metamaterial absorbers are photonic structures composed of an array of sub-wavelength metallic patterns. Results in literature are usually based on structures of nominal dimensions, despite the significant effect of fabrication tolerances on performance. This research aims to identify the main sources of uncertainty and to investigate their effect, notably that of an irregular surface quality (i.e., roughness) of the thin metallic layer and the lithography related variations in size and shape. The effect of the shape and positioning of the resonance peak was investigated and validated using mid-infrared metamaterial absorbers. This sensitivity analysis is essential to the batch fabrication of metamaterial absorbers for MEMS applications.

AB - Metamaterial absorbers are photonic structures composed of an array of sub-wavelength metallic patterns. Results in literature are usually based on structures of nominal dimensions, despite the significant effect of fabrication tolerances on performance. This research aims to identify the main sources of uncertainty and to investigate their effect, notably that of an irregular surface quality (i.e., roughness) of the thin metallic layer and the lithography related variations in size and shape. The effect of the shape and positioning of the resonance peak was investigated and validated using mid-infrared metamaterial absorbers. This sensitivity analysis is essential to the batch fabrication of metamaterial absorbers for MEMS applications.

KW - metamaterial absorber

KW - mid-infrared

KW - UV lithography

KW - tolerance sensitivity

KW - fabrication

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Y2 - 3 September 2017 through 6 September 2017

ER -

Fabrication Tolerance Sensitivity in Large-Area Mid-Infrared Metamaterial Absorbers

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