Fast deposition of microcrystalline silicon with an expanding thermal plasma

C Smit, EAG Hamers, BA Korevaar, RACMM Swaaij, MCM van de Sanden

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	98-102
Number of pages	5
Journal	Journal of Non-Crystalline Solids
Volume	299/302
Publication status	Published - 2002

wet 5

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This output contributes to the following UN Sustainable Development Goals (SDGs)

@article{5b5b30162bc64c5590d2501ba44cd0af,

title = "Fast deposition of microcrystalline silicon with an expanding thermal plasma",

keywords = "Elektrotechniek, Techniek, ZX CWTS 1.00 <= JFIS < 3.00",

author = "C Smit and EAG Hamers and BA Korevaar and RACMM Swaaij and {van de Sanden}, MCM",

note = "wet 5",

year = "2002",

language = "Undefined/Unknown",

volume = "299/302",

pages = "98--102",

journal = "Journal of Non-Crystalline Solids",

issn = "0022-3093",

publisher = "Elsevier",

}

TY - JOUR

T1 - Fast deposition of microcrystalline silicon with an expanding thermal plasma

AU - Smit, C

AU - Hamers, EAG

AU - Korevaar, BA

AU - Swaaij, RACMM

AU - van de Sanden, MCM

N1 - wet 5

PY - 2002

Y1 - 2002

KW - Elektrotechniek

KW - Techniek

KW - ZX CWTS 1.00 <= JFIS < 3.00

M3 - Article

SN - 0022-3093

VL - 299/302

SP - 98

EP - 102

JO - Journal of Non-Crystalline Solids

JF - Journal of Non-Crystalline Solids

ER -