Focused electron beam induced processing and the effect of substrate thickness revisited

WF van Dorp, A Beyer, M Mainka, A Gölzhäuser, TW Hansen, JB Wagner, CW Hagen, JTM de Hosson

    Research output: Contribution to journalArticleScientificpeer-review

    12 Citations (Scopus)
    Original languageUndefined/Unknown
    Pages (from-to)1-10
    Number of pages10
    JournalNanotechnology
    Volume24
    Issue number34
    Publication statusPublished - 2013

    Bibliographical note

    art.no. 345301

    Keywords

    • CWTS 0.75 <= JFIS < 2.00

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