Formation of modified graphene surface used for forming graphene layer fro device e.g. nanoelectromechnanical systems, involves providing defect-free grpahene monolayer, and providing molecules comprising binding group in solvent

GF Schneider; C Dekker

Formation of modified graphene surface used for forming graphene layer fro device e.g. nanoelectromechnanical systems, involves providing defect-free grpahene monolayer, and providing molecules comprising binding group in solvent

GF Schneider (Inventor), C Dekker (Inventor)

BN/Cees Dekker Lab

Research output: Patent

Abstract

WO2014182169-A2

Original language	Undefined/Unknown
Patent number	NL2010776-C
Priority date	13/11/14
Publication status	Published - 2014

Cite this

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title = "Formation of modified graphene surface used for forming graphene layer fro device e.g. nanoelectromechnanical systems, involves providing defect-free grpahene monolayer, and providing molecules comprising binding group in solvent",

abstract = "WO2014182169-A2",

author = "GF Schneider and C Dekker",

year = "2014",

language = "Undefined/Unknown",

type = "Patent",

note = "NL2010776-C",

}

TY - PAT

T1 - Formation of modified graphene surface used for forming graphene layer fro device e.g. nanoelectromechnanical systems, involves providing defect-free grpahene monolayer, and providing molecules comprising binding group in solvent

AU - Schneider, GF

AU - Dekker, C

PY - 2014

Y1 - 2014

N2 - WO2014182169-A2

AB - WO2014182169-A2

M3 - Patent

M1 - NL2010776-C

ER -