Formation of modified graphene surface used for forming graphene layer fro device e.g. nanoelectromechnanical systems, involves providing defect-free grpahene monolayer, and providing molecules comprising binding group in solvent

GF Schneider; C Dekker

Formation of modified graphene surface used for forming graphene layer fro device e.g. nanoelectromechnanical systems, involves providing defect-free grpahene monolayer, and providing molecules comprising binding group in solvent

GF Schneider (Inventor), C Dekker (Inventor)

BN/Cees Dekker Lab

Research output: Patent

Original language	Undefined/Unknown
Patent number	NL2010776-C
Priority date	13/11/14
Publication status	Published - 2014

Cite this

@misc{6197a8a700a4473e8b55a44736fb4ecf,

title = "Formation of modified graphene surface used for forming graphene layer fro device e.g. nanoelectromechnanical systems, involves providing defect-free grpahene monolayer, and providing molecules comprising binding group in solvent",

author = "GF Schneider and C Dekker",

year = "2014",

language = "Undefined/Unknown",

type = "Patent",

note = "NL2010776-C",

}