Further investigation of hydrogen silsesquioxane e-beam resist as etching mask for cryogenic silicon etching

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific

Original language	Undefined/Unknown
Title of host publication	Proceedings of SAFE 2008
Editors	s.n.
Place of Publication	veldhoven,the netherlands
Publisher	STW
Pages	527-530
Number of pages	4
ISBN (Print)	978-90-73461-56-7
Publication status	Published - 2008
Event	SAFE 2008, Veldhoven, the Netherlands - Veldhoven, the Nederlands Duration: 27 Nov 2008 → 28 Nov 2008

Name
Publisher	STW

Conference	SAFE 2008, Veldhoven, the Netherlands
Period	27/11/08 → 28/11/08

Keywords

@inproceedings{410a17398aef4eb2856142cdda17043a,

title = "Further investigation of hydrogen silsesquioxane e-beam resist as etching mask for cryogenic silicon etching",

keywords = "conference contrib. non-refer., Vakpubl., Overig wet. > 3 pag",

author = "CK Yang and G Pandraud and {Babaei Gavan}, K and {van der Drift}, EWJM and PJ French",

year = "2008",

language = "Undefined/Unknown",

isbn = "978-90-73461-56-7",

publisher = "STW",

pages = "527--530",

editor = "s.n.",

booktitle = "Proceedings of SAFE 2008",

note = "null ; Conference date: 27-11-2008 Through 28-11-2008",

}

Proceedings of SAFE 2008. ed. / s.n. veldhoven,the netherlands : STW, 2008. p. 527-530.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific

TY - GEN

T1 - Further investigation of hydrogen silsesquioxane e-beam resist as etching mask for cryogenic silicon etching

AU - Yang, CK

AU - Pandraud, G

AU - Babaei Gavan, K

AU - van der Drift, EWJM

AU - French, PJ

PY - 2008

Y1 - 2008

KW - conference contrib. non-refer.

KW - Vakpubl., Overig wet. > 3 pag

M3 - Conference contribution

SN - 978-90-73461-56-7

SP - 527

EP - 530

BT - Proceedings of SAFE 2008

A2 - s.n., null

PB - STW

CY - veldhoven,the netherlands

Y2 - 27 November 2008 through 28 November 2008

ER -