Helium depth profiles in silicon and silicon based materials: implantation energies from 20 to 400 keV

I Montilla, A Rivera, A van Veen

    Research output: Book/ReportReportProfessional

    Original languageUndefined/Unknown
    PublisherUnknown Publisher
    Number of pages7
    Publication statusPublished - 1999

    Keywords

    • ZX Int.klas.verslagjaar < 2002

    Cite this

    Montilla, I., Rivera, A., & van Veen, A. (1999). Helium depth profiles in silicon and silicon based materials: implantation energies from 20 to 400 keV. Unknown Publisher.