Helium depth profiles in silicon and silicon based materials: implantation energies from 20 to 400 keV

I Montilla, A Rivera, A van Veen

    Research output: Book/ReportReportProfessional

    Original languageUndefined/Unknown
    PublisherUnknown Publisher
    Number of pages7
    Publication statusPublished - 1999

    Bibliographical note

    IRI-131-99-027

    Keywords

    • ZX Int.klas.verslagjaar < 2002

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