Helium implantation in silicon: the effects of implantation temperature

E Oliviero, ML David, AV Fedorov, A van Veen, MF Beaufort, JF Barbot

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	222-227
Number of pages	6
Journal	Materials Science and Engineering B: Advanced Functional Solid-state Materials
Volume	102
Publication status	Published - 2003

Keywords

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title = "Helium implantation in silicon: the effects of implantation temperature",

keywords = "ZX CWTS JFIS < 1.00",

author = "E Oliviero and ML David and AV Fedorov and {van Veen}, A and MF Beaufort and JF Barbot",

year = "2003",

language = "Undefined/Unknown",

volume = "102",

pages = "222--227",

journal = "Materials Science and Engineering B: Advanced Functional Solid-state Materials",

issn = "0921-5107",

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TY - JOUR

T1 - Helium implantation in silicon: the effects of implantation temperature

AU - Oliviero, E

AU - David, ML

AU - Fedorov, AV

AU - van Veen, A

AU - Beaufort, MF

AU - Barbot, JF

PY - 2003

Y1 - 2003

KW - ZX CWTS JFIS < 1.00

M3 - Article

SN - 0921-5107

VL - 102

SP - 222

EP - 227

JO - Materials Science and Engineering B: Advanced Functional Solid-state Materials

JF - Materials Science and Engineering B: Advanced Functional Solid-state Materials

ER -