Helium implantation in silicon: the effects of implantation temperature

E Oliviero, ML David, AV Fedorov, A van Veen, MF Beaufort, JF Barbot

    Research output: Contribution to journalArticleScientificpeer-review

    6 Citations (Scopus)
    Original languageUndefined/Unknown
    Pages (from-to)222-227
    Number of pages6
    JournalMaterials Science and Engineering B: Advanced Functional Solid-state Materials
    Volume102
    Publication statusPublished - 2003

    Keywords

    • ZX CWTS JFIS < 1.00

    Cite this

    Oliviero, E., David, ML., Fedorov, AV., van Veen, A., Beaufort, MF., & Barbot, JF. (2003). Helium implantation in silicon: the effects of implantation temperature. Materials Science and Engineering B: Advanced Functional Solid-state Materials, 102, 222-227.