High aspect ratio cryogenic etching of silicon with SF6/O2 plasma

G Cracium, MA Blauw, EWJM van der Drift, PJ French

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Original languageUndefined/Unknown
Title of host publicationSAFE - ProRISC - SeSens 2001: proceedings. Semiconductor Advances for Future Electronics - Program for Research on Integrated Systems and Circuits - Semiconductor Sensor and Actuator Technology
Place of PublicationUtrecht
PublisherSTW Technology Foundation
Number of pages4
ISBN (Print)90-73461-29-4
Publication statusPublished - 2001
EventSAFE ProRISC SeSens 2001, Veldhoven - Utrecht
Duration: 28 Nov 200130 Nov 2001

Publication series

PublisherSTW technology foundation


ConferenceSAFE ProRISC SeSens 2001, Veldhoven


  • ZX Int.klas.verslagjaar < 2002

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