High aspect ratio cyrogenic etching of Silicon with SF6/O2 plasma.

G Craciun, MA Blauw, EWJM van der Drift, PJ French

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

Original languageUndefined/Unknown
Title of host publicationProceedings of the 2nd Workshop on Semiconductors Sensor and Actuator Technology (SESENS).
EditorsSTW Technologiestichting
Pages783-786
Number of pages4
Publication statusPublished - 2001

Keywords

  • ZX Int.klas.verslagjaar < 2002

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