High aspect ratio cyrogenic etching of Silicon with SF6/O2 plasma.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific

Original language	Undefined/Unknown
Title of host publication	Proceedings of the 2nd Workshop on Semiconductors Sensor and Actuator Technology (SESENS).
Editors	STW Technologiestichting
Pages	783-786
Number of pages	4
Publication status	Published - 2001

Keywords

@inproceedings{a930cf7502a342b5bb969e0b3420f1b6,

title = "High aspect ratio cyrogenic etching of Silicon with SF6/O2 plasma.",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "G Craciun and MA Blauw and {van der Drift}, EWJM and PJ French",

year = "2001",

language = "Undefined/Unknown",

isbn = "90-73461-29-4",

pages = "783--786",

editor = "STW Technologiestichting",

booktitle = "Proceedings of the 2nd Workshop on Semiconductors Sensor and Actuator Technology (SESENS).",

}

Proceedings of the 2nd Workshop on Semiconductors Sensor and Actuator Technology (SESENS).. ed. / STW Technologiestichting. 2001. p. 783-786.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific

TY - GEN

T1 - High aspect ratio cyrogenic etching of Silicon with SF6/O2 plasma.

AU - Craciun, G

AU - Blauw, MA

AU - van der Drift, EWJM

AU - French, PJ

PY - 2001

Y1 - 2001

KW - ZX Int.klas.verslagjaar < 2002

M3 - Conference contribution

SN - 90-73461-29-4

SP - 783

EP - 786

BT - Proceedings of the 2nd Workshop on Semiconductors Sensor and Actuator Technology (SESENS).

A2 - Technologiestichting, STW

ER -