High-dose exposure of silicon in electron beam lithography

Research output: Contribution to journalArticleScientificpeer-review

4 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)013005-1-013005-4
JournalJournal of Micro/Nanolithography, MEMS, and MOEMS
Volume7
Issue number1
Publication statusPublished - 2008

Keywords

  • CWTS JFIS < 0.75

Cite this