High performance single grain SI TFTs inside a location-controlled grain by µ-Czochralski process with capping-layer

R Vikas, R Ishihara, Y Hiroshima, D Abe, S Inoue, T Shimoda, JW Metselaar, CIM Beenakker

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Original languageUndefined/Unknown
Title of host publicationProceedings of the 2005 International Electron Devices Meeting IEDM
Editors s.n.
Place of PublicationPiscataway
PublisherIEEE Society
Pages1-4
Number of pages4
Publication statusPublished - 2005
Event2005 International Electron Devices Meeting IEDM, Washington, DC, USA - Piscataway
Duration: 5 Dec 20057 Dec 2005

Publication series

Name
PublisherIEEE

Conference

Conference2005 International Electron Devices Meeting IEDM, Washington, DC, USA
Period5/12/057/12/05

Bibliographical note

Editor onbekend JH

Keywords

  • conference contrib. refereed
  • Conf.proc. > 3 pag

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