High quality SiO2 deposited at 80oC by inductively coupled plasma enhanced CVD for flexible display application

Research output: Contribution to journalArticleScientificpeer-review

8 Citations (Scopus)
Original languageEnglish
Pages (from-to)89-91
Number of pages3
JournalElectrochemical and Solid-State Letters
Volume13
Issue number8
DOIs
Publication statusPublished - 2010

Keywords

  • CWTS 0.75 <= JFIS < 2.00

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