High quality SiO2 deposited under 100oC by inductively coupled plasma (ICP) enhanced CVD

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Original languageUndefined/Unknown
Title of host publicationDigest of technical papers of the fifteenth international workshop on active-matrix flatpanel displays and devices -TFT technologies and FPD materials
EditorsH Hamada
Place of PublicationTokio, Japan.
PublisherJapan Society of Applied Physics
Pages49-52
Number of pages4
Publication statusPublished - 2008
EventFifteenth international workshop on active-matrix flatpanel displays and devices, TFT technologies and FPD materials, Tokio, Japan - Tokio, Japan.
Duration: 2 Jul 20084 Jul 2008

Publication series

Name
PublisherThe Japan Society of Applied Physics

Conference

ConferenceFifteenth international workshop on active-matrix flatpanel displays and devices, TFT technologies and FPD materials, Tokio, Japan
Period2/07/084/07/08

Keywords

  • conference contrib. refereed
  • Conf.proc. > 3 pag

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