High resolution resist-free lithography in the SEM

INIS

• resolution 100%
• scanning electron microscopy 100%
• resist 100%
• electron beams 100%
• electrons 66%
• surfaces 50%
• precursor 50%
• dissociation 33%
• energy 33%
• emission 16%
• laboratories 16%
• deposits 16%
• applications 16%
• fabrication 16%
• processing 16%
• interactions 16%
• silicon 16%
• molecules 16%
• etching 16%
• beams 16%
• volatility 16%
• deposition 16%
• gases 16%

Material Science

• Scanning Electron Microscopy 100%
• Surface 100%
• Lithography 100%
• Nanofabrication Process 66%
• Bulk Silicon 33%
• Gas 33%
• Nanopatterning 33%

Engineering

• Secondary Electrons 100%
• Backscattered Electron 33%
• Scanning Electron Microscope 33%
• Precursor Molecule 33%
• High Energy 33%
• Nanometre 33%
• Development 33%
• Sample Surface 33%
• Complementary Technique 33%
• Energy Engineering 33%