High Speed anisotropic dry etching of CoNbZr for next generation magnetic recording.

MSP Andriesse, T Zijlstra, EWJM van der Drift

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	3462-3466
Number of pages	5
Journal	Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume	18
Issue number	6
Publication status	Published - 2000

Keywords

@article{0481145cab03450bba43efd77333ef6c,

title = "High Speed anisotropic dry etching of CoNbZr for next generation magnetic recording.",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "MSP Andriesse and T Zijlstra and {van der Drift}, EWJM",

year = "2000",

language = "Undefined/Unknown",

volume = "18",

pages = "3462--3466",

journal = "Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "6",

}

TY - JOUR

T1 - High Speed anisotropic dry etching of CoNbZr for next generation magnetic recording.

AU - Andriesse, MSP

AU - Zijlstra, T

AU - van der Drift, EWJM

PY - 2000

Y1 - 2000

KW - ZX Int.klas.verslagjaar < 2002

M3 - Article

SN - 1071-1023

VL - 18

SP - 3462

EP - 3466

JO - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

IS - 6

ER -