High speed anisotropic dry etching of CoNbZr for next generation magnetic recording.

MSP Andriesse, T Zijlstra, EWJM van der Drift

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific

Original language	Undefined/Unknown
Title of host publication	Proceedings of the 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofrabrication.
Pages	3462-3466
Number of pages	5
Publication status	Published - 2000

Keywords

@inproceedings{b399c032169f45959ec87fec6ff954d4,

title = "High speed anisotropic dry etching of CoNbZr for next generation magnetic recording.",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "MSP Andriesse and T Zijlstra and \{van der Drift\}, EWJM",

year = "2000",

language = "Undefined/Unknown",

isbn = "1-56396-969-6",

pages = "3462--3466",

booktitle = "Proceedings of the 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofrabrication.",

}

High speed anisotropic dry etching of CoNbZr for next generation magnetic recording. / Andriesse, MSP; Zijlstra, T; van der Drift, EWJM.
Proceedings of the 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofrabrication.. 2000. p. 3462-3466.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific

TY - GEN

T1 - High speed anisotropic dry etching of CoNbZr for next generation magnetic recording.

AU - Andriesse, MSP

AU - Zijlstra, T

AU - van der Drift, EWJM

PY - 2000

Y1 - 2000

KW - ZX Int.klas.verslagjaar < 2002

UR - https://www.scopus.com/pages/publications/0034317290

M3 - Conference contribution

SN - 1-56396-969-6

SP - 3462

EP - 3466

BT - Proceedings of the 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofrabrication.

ER -