High speed, dry etching of Fe for integration of magnetic devices in microelectronics.

MSP Andriesse, EWJM van der Drift, WG Sloof

Research output: Contribution to journalArticleScientificpeer-review

1 Citation (Scopus)
Original languageUndefined/Unknown
Pages (from-to)2901-2905
Number of pages5
JournalJournal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume19
Publication statusPublished - 2001

Keywords

  • ZX Int.klas.verslagjaar < 2002

Cite this