High speed, dry etching of Fe for integration of magnetic devices in microelectronics.

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	2901-2905
Number of pages	5
Journal	Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume	19
Publication status	Published - 2001

Keywords

@article{ea12c454b71346578cbd07d6e2ced1dc,

title = "High speed, dry etching of Fe for integration of magnetic devices in microelectronics.",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "MSP Andriesse and {van der Drift}, EWJM and WG Sloof",

year = "2001",

language = "Undefined/Unknown",

volume = "19",

pages = "2901--2905",

journal = "Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

}

TY - JOUR

T1 - High speed, dry etching of Fe for integration of magnetic devices in microelectronics.

AU - Andriesse, MSP

AU - van der Drift, EWJM

AU - Sloof, WG

PY - 2001

Y1 - 2001

KW - ZX Int.klas.verslagjaar < 2002

M3 - Article

SN - 1071-1023

VL - 19

SP - 2901

EP - 2905

JO - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

ER -