High-temperature tensile tests and activation volume measurement of free-standing submicron Al films

AJ Kalkman, AH Verbruggen, S Radelaar

    Research output: Contribution to journalArticleScientificpeer-review

    16 Citations (Scopus)
    Original languageUndefined/Unknown
    Pages (from-to)6612-6615
    Number of pages4
    JournalJournal of Applied Physics
    Volume92
    Issue number11
    Publication statusPublished - 2002

    Keywords

    • academic journal papers
    • ZX CWTS 1.00 <= JFIS < 3.00

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