@inproceedings{3a7942ad1dad42e4a779e4b3107c20ce,
title = "High-throughput parallel SPM for metrology, defect, and mask inspection",
author = "{Sadeghian Marnani}, H and RW Herfst and {van den Dool}, TC and WE Crowcombe and J Winters and GFIJ Kramer",
note = "NEO; 30th European Mask and Lithography Conference, Dresden, Germany ; Conference date: 24-06-2014 Through 25-06-2014",
year = "2014",
doi = "10.1117/12.2065939",
language = "English",
isbn = "9781628412857",
publisher = "SPIE",
pages = "92310B--1--92310B--6",
editor = "FW Behringer",
booktitle = "Proceedings of the 30th European Mask and Lithography Conference",
address = "United States",
}