High-throughput parallel SPM for metrology, defect, and mask inspection

H Sadeghian Marnani, RW Herfst, TC van den Dool, WE Crowcombe, J Winters, GFIJ Kramer

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

5 Citations (Scopus)
Original languageEnglish
Title of host publicationProceedings of the 30th European Mask and Lithography Conference
EditorsFW Behringer
Place of PublicationBellingham, WA, USA
PublisherSPIE
Pages92310B-1-92310B-6
ISBN (Print)9781628412857
DOIs
Publication statusPublished - 2014
Event30th European Mask and Lithography Conference, Dresden, Germany - Bellingham, WA, USA
Duration: 24 Jun 201425 Jun 2014

Publication series

Name
PublisherSPIE
NameProceedings of SPIE- International Society for Optical Engineering
Volume9231
ISSN (Print)0277-786X

Conference

Conference30th European Mask and Lithography Conference, Dresden, Germany
Period24/06/1425/06/14

Cite this