High-throughput parallel SPM for metrology, defect, and mask inspection

H Sadeghian Marnani; RW Herfst; TC van den Dool; WE Crowcombe; J Winters; GFIJ Kramer

doi:10.1117/12.2065939

High-throughput parallel SPM for metrology, defect, and mask inspection

H Sadeghian Marnani, RW Herfst, TC van den Dool, WE Crowcombe, J Winters, GFIJ Kramer

Computational Design and Mechanics

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

5 Citations (Scopus)

Original language	English
Title of host publication	Proceedings of the 30th European Mask and Lithography Conference
Editors	FW Behringer
Place of Publication	Bellingham, WA, USA
Publisher	SPIE
Pages	92310B-1-92310B-6
ISBN (Print)	9781628412857
DOIs	https://doi.org/10.1117/12.2065939
Publication status	Published - 2014
Event	30th European Mask and Lithography Conference, Dresden, Germany - Bellingham, WA, USA Duration: 24 Jun 2014 → 25 Jun 2014

Publication series

Name
Publisher	SPIE

Name	Proceedings of SPIE- International Society for Optical Engineering
Volume	9231
ISSN (Print)	0277-786X

Conference

Conference	30th European Mask and Lithography Conference, Dresden, Germany
Period	24/06/14 → 25/06/14

Bibliographical note

NEO

Access to Document

10.1117/12.2065939

Cite this

Sadeghian Marnani, H., Herfst, RW., van den Dool, TC., Crowcombe, WE., Winters, J., & Kramer, GFIJ. (2014). High-throughput parallel SPM for metrology, defect, and mask inspection. In FW. Behringer (Ed.), Proceedings of the 30th European Mask and Lithography Conference (pp. 92310B-1-92310B-6). (Proceedings of SPIE- International Society for Optical Engineering; Vol. 9231). SPIE. https://doi.org/10.1117/12.2065939

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title = "High-throughput parallel SPM for metrology, defect, and mask inspection",

author = "{Sadeghian Marnani}, H and RW Herfst and {van den Dool}, TC and WE Crowcombe and J Winters and GFIJ Kramer",

note = "NEO; 30th European Mask and Lithography Conference, Dresden, Germany ; Conference date: 24-06-2014 Through 25-06-2014",

year = "2014",

doi = "10.1117/12.2065939",

language = "English",

isbn = "9781628412857",

publisher = "SPIE",

pages = "92310B--1--92310B--6",

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address = "United States",

}

Sadeghian Marnani, H, Herfst, RW, van den Dool, TC, Crowcombe, WE, Winters, J & Kramer, GFIJ 2014, High-throughput parallel SPM for metrology, defect, and mask inspection. in FW Behringer (ed.), Proceedings of the 30th European Mask and Lithography Conference. Proceedings of SPIE- International Society for Optical Engineering, vol. 9231, SPIE, Bellingham, WA, USA, pp. 92310B-1-92310B-6, 30th European Mask and Lithography Conference, Dresden, Germany, 24/06/14. https://doi.org/10.1117/12.2065939

High-throughput parallel SPM for metrology, defect, and mask inspection. / Sadeghian Marnani, H; Herfst, RW; van den Dool, TC et al.
Proceedings of the 30th European Mask and Lithography Conference. ed. / FW Behringer. Bellingham, WA, USA: SPIE, 2014. p. 92310B-1-92310B-6 (Proceedings of SPIE- International Society for Optical Engineering; Vol. 9231).

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - High-throughput parallel SPM for metrology, defect, and mask inspection

AU - Sadeghian Marnani, H

AU - Herfst, RW

AU - van den Dool, TC

AU - Crowcombe, WE

AU - Winters, J

AU - Kramer, GFIJ

N1 - NEO

PY - 2014

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DO - 10.1117/12.2065939

M3 - Conference contribution

SN - 9781628412857

SP - 92310B-1-92310B-6

BT - Proceedings of the 30th European Mask and Lithography Conference

A2 - Behringer, FW

PB - SPIE

CY - Bellingham, WA, USA

T2 - 30th European Mask and Lithography Conference, Dresden, Germany

Y2 - 24 June 2014 through 25 June 2014

ER -

Sadeghian Marnani H, Herfst RW, van den Dool TC, Crowcombe WE, Winters J, Kramer GFIJ. High-throughput parallel SPM for metrology, defect, and mask inspection. In Behringer FW, editor, Proceedings of the 30th European Mask and Lithography Conference. Bellingham, WA, USA: SPIE. 2014. p. 92310B-1-92310B-6. (Proceedings of SPIE- International Society for Optical Engineering). doi: 10.1117/12.2065939

High-throughput parallel SPM for metrology, defect, and mask inspection

Publication series

Conference

Bibliographical note

Access to Document

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Cite this