Highly controllable electrochemical deep etchning process on silicon

Y Chen, L Wang, PM Sarro

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific

Original language	Undefined/Unknown
Title of host publication	Proc. IEEE MEMS 2005 Conference
Editors	s.n.
Place of Publication	Piscataway
Publisher	IEEE Society
Pages	512-515
Number of pages	4
ISBN (Print)	0-7803-8733-3
Publication status	Published - 2005
Event	18th IEEE International conference on micro electro mechanical systems, Miami Beach, USA - Piscataway Duration: 30 Jan 2005 → 3 Feb 2005

Name
Publisher	IEEE

Conference	18th IEEE International conference on micro electro mechanical systems, Miami Beach, USA
Period	30/01/05 → 3/02/05

Keywords

@inproceedings{383be062bdd745c8aeb2247888ba1766,

title = "Highly controllable electrochemical deep etchning process on silicon",

keywords = "Conf.proc. > 3 pag",

author = "Y Chen and L Wang and PM Sarro",

year = "2005",

language = "Undefined/Unknown",

isbn = "0-7803-8733-3",

publisher = "IEEE Society",

pages = "512--515",

editor = "s.n.",

booktitle = "Proc. IEEE MEMS 2005 Conference",

note = "null ; Conference date: 30-01-2005 Through 03-02-2005",

}

TY - GEN

T1 - Highly controllable electrochemical deep etchning process on silicon

AU - Chen, Y

AU - Wang, L

AU - Sarro, PM

PY - 2005

Y1 - 2005

KW - Conf.proc. > 3 pag

M3 - Conference contribution

SN - 0-7803-8733-3

SP - 512

EP - 515

BT - Proc. IEEE MEMS 2005 Conference

A2 - s.n., null

PB - IEEE Society

CY - Piscataway

Y2 - 30 January 2005 through 3 February 2005

ER -