HSQ/novolak bilayer resist for high aspect ratio nanoscale e-beam lithography.

FCMJM van Delft, JP Weterings, AK Suurling, J Romijn

Research output: Contribution to journalArticleScientificpeer-review

109 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)3419-3423
Number of pages5
JournalJournal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume18
Issue number6
Publication statusPublished - 2000

Keywords

  • ZX Int.klas.verslagjaar < 2002

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