Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographics

M Peuker, MH Lim, HI Smith, R Morton, AK Suurling, J Romijn, EWJM van der Drift, FCMJM van Delft

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	803-809
Number of pages	7
Journal	Microelectronic Engineering
Volume	61-62
Publication status	Published - 2002

Keywords

@article{9ab0f35938454f3aa44c737a34c2970b,

title = "Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographics",

keywords = "academic journal papers, ZX CWTS JFIS < 1.00",

author = "M Peuker and MH Lim and HI Smith and R Morton and AK Suurling and J Romijn and {van der Drift}, EWJM and {van Delft}, FCMJM",

year = "2002",

language = "Undefined/Unknown",

volume = "61-62",

pages = "803--809",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

}

TY - JOUR

T1 - Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographics

AU - Peuker, M

AU - Lim, MH

AU - Smith, HI

AU - Morton, R

AU - Suurling, AK

AU - Romijn, J

AU - van der Drift, EWJM

AU - van Delft, FCMJM

PY - 2002

Y1 - 2002

KW - academic journal papers

KW - ZX CWTS JFIS < 1.00

M3 - Article

SN - 0167-9317

VL - 61-62

SP - 803

EP - 809

JO - Microelectronic Engineering

JF - Microelectronic Engineering

ER -