Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographics

M Peuker, MH Lim, HI Smith, R Morton, AK Suurling, J Romijn, EWJM van der Drift, FCMJM van Delft

Research output: Contribution to journalArticleScientificpeer-review

28 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)803-809
Number of pages7
JournalMicroelectronic Engineering
Volume61-62
Publication statusPublished - 2002

Keywords

  • academic journal papers
  • ZX CWTS JFIS < 1.00

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