IC-compatible process for pattern transfer in deep wells for integration of RF components

PN Pham, PM Sarro, JN Burghartz

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

17 Citations (Scopus)
Original languageUndefined/Unknown
Title of host publicationProceedings of SPIE, vol. 4174
Editors J-M Karam, J Yasaitis
Place of PublicationBellingham
PublisherInternational Society for Optical Engineering
Pages390-397
Number of pages8
ISBN (Print)0-8194-3830-8
Publication statusPublished - 2000
EventMicromachining and Microfabrication Pocess Technology VI, Santa Clara - Bellingham
Duration: 18 Sep 200020 Sep 2000

Publication series

Name
PublisherInternational Society for Optical Engineering

Conference

ConferenceMicromachining and Microfabrication Pocess Technology VI, Santa Clara
Period18/09/0020/09/00

Keywords

  • ZX Int.klas.verslagjaar < 2002

Cite this

Pham, PN., Sarro, PM., & Burghartz, JN. (2000). IC-compatible process for pattern transfer in deep wells for integration of RF components. In J-M Karam, & J Yasaitis (Eds.), Proceedings of SPIE, vol. 4174 (pp. 390-397). International Society for Optical Engineering.