Impact of pixel-dose optimization on pattern fidelity for helium ion beam lithography on EUV resist

N Kalhor, W Mulckhuyse, PFA Alkemade, D Maas

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

7 Citations (Scopus)
Original languageEnglish
Title of host publicationAdvances in Patterning Materials and Processes XXXII
EditorsTI Wallow, CK Hohle
Place of PublicationBellingham, WA, USA
PublisherSPIE
Pages1-9
Number of pages9
ISBN (Print)9781628415278
DOIs
Publication statusPublished - 2015
EventAdvances in Patterning Materials and Processes XXXII, San Jose, CA, USA - Bellingham, WA, USA
Duration: 23 Feb 201526 Feb 2015

Publication series

Name
PublisherSPIE
NameProceedings of SPIE- International Society for Optical Engineering
Volume9425
ISSN (Print)0277-786X

Conference

ConferenceAdvances in Patterning Materials and Processes XXXII, San Jose, CA, USA
Period23/02/1526/02/15

Bibliographical note

Harvest

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