@inproceedings{a52dc4ba531e4713af999dd29742b247,
title = "Impact of pixel-dose optimization on pattern fidelity for helium ion beam lithography on EUV resist",
author = "N Kalhor and W Mulckhuyse and PFA Alkemade and D Maas",
note = "Harvest; Advances in Patterning Materials and Processes XXXII, San Jose, CA, USA ; Conference date: 23-02-2015 Through 26-02-2015",
year = "2015",
doi = "10.1117/12.2085791",
language = "English",
isbn = "9781628415278",
publisher = "SPIE",
pages = "1--9",
editor = "TI Wallow and CK Hohle",
booktitle = "Advances in Patterning Materials and Processes XXXII",
address = "United States",
}