Importance of point defect reactions for the atomic-scale roughness of III-V nanowire sidewalls

Adrian Díaz Álvarez, Nemanja Peric, Nathali Alexandra Franchina Vergel, Jean Philippe Nys, Maxime Berthe, Gilles Patriarche, Jean Christophe Harmand, Philippe Caroff, Sébastien Plissard, More Authors

Research output: Contribution to journal › Article › Scientific › peer-review

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Material Science

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