Improvement of contact resistances on plasma-exposed silicon carbide.

R Cheung, J Hay, EWJM van der Drift, W Gao

Research output: Contribution to journalArticleScientificpeer-review

6 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)2081-2083
Number of pages3
JournalSolid-State Electronics
Volume44
Issue number12
Publication statusPublished - 2000

Keywords

  • ZX Int.klas.verslagjaar < 2002

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