Improvement of material properties by employing external RF substrate bias during a-Si:H deposition by a remote expending thermal plasma

AHM Smets; AMHN Petit; V Nadazdy; WMM Kessels; RACMM van Swaaij; MCM van de Sanden

Improvement of material properties by employing external RF substrate bias during a-Si:H deposition by a remote expending thermal plasma

AHM Smets, AMHN Petit, V Nadazdy, WMM Kessels, RACMM van Swaaij, MCM van de Sanden

Electronic Components, Technology and Materials

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	Undefined/Unknown
Title of host publication	Proceedings of the 20th european photovoltaic solar energy conference
Editors	W Palz, HA Ossenbrink, P Helm
Place of Publication	Munich, Germany
Publisher	WIP
Pages	1639-1642
Number of pages	4
ISBN (Print)	3-936338-19-1
Publication status	Published - 2005
Event	20th EU PVSEC, 20th European Photovoltaic Solar Energy Conference; Barcelona, Spain - Munich, Germany Duration: 6 Jun 2005 → 10 Jun 2005

Publication series

Name
Publisher	WIP

Conference

Conference	20th EU PVSEC, 20th European Photovoltaic Solar Energy Conference; Barcelona, Spain
Period	6/06/05 → 10/06/05

Keywords

conference contrib. refereed
Conf.proc. > 3 pag

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

Cite this

Smets, AHM., Petit, AMHN., Nadazdy, V., Kessels, WMM., van Swaaij, RACMM., & van de Sanden, MCM. (2005). Improvement of material properties by employing external RF substrate bias during a-Si:H deposition by a remote expending thermal plasma. In W. Palz, HA. Ossenbrink, & P. Helm (Eds.), Proceedings of the 20th european photovoltaic solar energy conference (pp. 1639-1642). WIP.

@inproceedings{f038a3cf2759439b96a64192b610fe35,

title = "Improvement of material properties by employing external RF substrate bias during a-Si:H deposition by a remote expending thermal plasma",

keywords = "conference contrib. refereed, Conf.proc. > 3 pag",

author = "AHM Smets and AMHN Petit and V Nadazdy and WMM Kessels and {van Swaaij}, RACMM and {van de Sanden}, MCM",

year = "2005",

language = "Undefined/Unknown",

isbn = "3-936338-19-1",

publisher = "WIP",

pages = "1639--1642",

editor = "W Palz and HA Ossenbrink and P Helm",

booktitle = "Proceedings of the 20th european photovoltaic solar energy conference",

note = "20th EU PVSEC, 20th European Photovoltaic Solar Energy Conference; Barcelona, Spain ; Conference date: 06-06-2005 Through 10-06-2005",

}

Smets, AHM, Petit, AMHN, Nadazdy, V, Kessels, WMM, van Swaaij, RACMM & van de Sanden, MCM 2005, Improvement of material properties by employing external RF substrate bias during a-Si:H deposition by a remote expending thermal plasma. in W Palz, HA Ossenbrink & P Helm (eds), Proceedings of the 20th european photovoltaic solar energy conference. WIP, Munich, Germany, pp. 1639-1642, 20th EU PVSEC, 20th European Photovoltaic Solar Energy Conference; Barcelona, Spain, 6/06/05.

Improvement of material properties by employing external RF substrate bias during a-Si:H deposition by a remote expending thermal plasma. / Smets, AHM; Petit, AMHN; Nadazdy, V et al.
Proceedings of the 20th european photovoltaic solar energy conference. ed. / W Palz; HA Ossenbrink; P Helm. Munich, Germany: WIP, 2005. p. 1639-1642.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Improvement of material properties by employing external RF substrate bias during a-Si:H deposition by a remote expending thermal plasma

AU - Smets, AHM

AU - Petit, AMHN

AU - Nadazdy, V

AU - Kessels, WMM

AU - van Swaaij, RACMM

AU - van de Sanden, MCM

PY - 2005

Y1 - 2005

KW - conference contrib. refereed

KW - Conf.proc. > 3 pag

M3 - Conference contribution

SN - 3-936338-19-1

SP - 1639

EP - 1642

BT - Proceedings of the 20th european photovoltaic solar energy conference

A2 - Palz, W

A2 - Ossenbrink, HA

A2 - Helm, P

PB - WIP

CY - Munich, Germany

T2 - 20th EU PVSEC, 20th European Photovoltaic Solar Energy Conference; Barcelona, Spain

Y2 - 6 June 2005 through 10 June 2005

ER -

Smets AHM, Petit AMHN, Nadazdy V, Kessels WMM, van Swaaij RACMM, van de Sanden MCM. Improvement of material properties by employing external RF substrate bias during a-Si:H deposition by a remote expending thermal plasma. In Palz W, Ossenbrink HA, Helm P, editors, Proceedings of the 20th european photovoltaic solar energy conference. Munich, Germany: WIP. 2005. p. 1639-1642