In Situ Annealing of Boron-Doped Amorphous Silicon Layers Using APCVD Technology

Vaibhav V. Kuruganti*, Alexander Mazurov, Sven Seren, Olindo Isabella, Valentin D. Mihailetchi

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

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Material Science

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Engineering