In situ monitoring of optical and structural switching in epitaxial YHx switchable mirrors

J. W.J. Kerssemakers, S. J. ven der Molen, R. Günther, B. Dam, R. Griessen

Research output: Contribution to journalArticleScientificpeer-review

4 Citations (Scopus)

Abstract

A detailed study is presented of the spectacular 'Manhattan switching', occurring during hydriding of epitaxial YHx switchable mirrors. Manhattan switching involves block-wise domain switching, both in an optical and a structural sense, of discrete areas of a switchable mirror between its conductive metallic YH2 state and its insulating YH3 state. By means of in situ atomic force microscopy we link this domain-wise switching to the accompanying changes in resistivity and transmission of a switching mirror. We find that, relative to the optical transition and the resistivity, the structural switching is retarded compared to polycrystalline films. Further, the Manhattan effect is governed by the switching properties of the domain boundaries, that form a regular, connected network of ridges. This crucial role of the network can well be explained by assuming local variations of mechanical properties around each ridge. The findings stress the importance of local investigations on switchable mirrors.

Original languageEnglish
Pages (from-to)342-347
Number of pages6
JournalJournal of Alloys and Compounds
Volume330
Issue number332
DOIs
Publication statusPublished - 17 Jan 2002

Bibliographical note

Funding Information:
This work was supported by the Stichting voor Fundamenteel Onderzoek der Materie (FOM), which is financed by N.W.O. We also acknowledge financial contribution of the European Commission through the TMR program (research network ‘Metal hydrides with switchable physical properties’).

Keywords

  • Atomic force microscopy
  • Hydrogen in metals
  • Metal-insulator transitions
  • Surface analysis
  • Vapour deposition

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