Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl-2

CF Carlstrom; R van der Heijden; AAM Kok; RW van der Heijden; F Karouta; JJGM van der Tol; R Nötzel; PJ van Veldhoven; HWM Salemink

Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl-2

CF Carlstrom, R van der Heijden, AAM Kok, RW van der Heijden, F Karouta, JJGM van der Tol, R Nötzel, PJ van Veldhoven, HWM Salemink

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	Undefined/Unknown
Title of host publication	Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl-2
Editors	JH Marsh
Place of Publication	Glasgow, Scotland
Publisher	IEEE Society
Pages	500-503
Number of pages	4
ISBN (Print)	0-7803-8891-7
Publication status	Published - 2005
Event	International Conference on Indium Phosphide and Related Materials, 2005 - Glasgow, Scotland Duration: 8 May 2005 → 12 May 2005

Publication series

Name
Publisher	IEEE

Conference

Conference	International Conference on Indium Phosphide and Related Materials, 2005
Period	8/05/05 → 12/05/05

Keywords

conference contrib. refereed
Conf.proc. > 3 pag

Cite this

Carlstrom, CF., van der Heijden, R., Kok, AAM., van der Heijden, RW., Karouta, F., van der Tol, JJGM., Nötzel, R., van Veldhoven, PJ., & Salemink, HWM. (2005). Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl-2. In JH. Marsh (Ed.), Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl-2 (pp. 500-503). IEEE Society.

@inproceedings{fa19931db2804088b68fe7dd9c1e85a1,

title = "Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl-2",

keywords = "conference contrib. refereed, Conf.proc. > 3 pag",

author = "CF Carlstrom and {van der Heijden}, R and AAM Kok and {van der Heijden}, RW and F Karouta and {van der Tol}, JJGM and R N{\"o}tzel and {van Veldhoven}, PJ and HWM Salemink",

year = "2005",

language = "Undefined/Unknown",

isbn = "0-7803-8891-7",

publisher = "IEEE Society",

pages = "500--503",

editor = "JH Marsh",

booktitle = "Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl-2",

note = "International Conference on Indium Phosphide and Related Materials, 2005 ; Conference date: 08-05-2005 Through 12-05-2005",

}

Carlstrom, CF, van der Heijden, R, Kok, AAM, van der Heijden, RW, Karouta, F, van der Tol, JJGM, Nötzel, R, van Veldhoven, PJ & Salemink, HWM 2005, Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl-2. in JH Marsh (ed.), Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl-2. IEEE Society, Glasgow, Scotland, pp. 500-503, International Conference on Indium Phosphide and Related Materials, 2005, 8/05/05.

Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl-2. / Carlstrom, CF; van der Heijden, R; Kok, AAM et al.
Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl-2. ed. / JH Marsh. Glasgow, Scotland: IEEE Society, 2005. p. 500-503.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl-2

AU - Carlstrom, CF

AU - van der Heijden, R

AU - Kok, AAM

AU - van der Heijden, RW

AU - Karouta, F

AU - van der Tol, JJGM

AU - Nötzel, R

AU - van Veldhoven, PJ

AU - Salemink, HWM

PY - 2005

Y1 - 2005

KW - conference contrib. refereed

KW - Conf.proc. > 3 pag

M3 - Conference contribution

SN - 0-7803-8891-7

SP - 500

EP - 503

BT - Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl-2

A2 - Marsh, JH

PB - IEEE Society

CY - Glasgow, Scotland

T2 - International Conference on Indium Phosphide and Related Materials, 2005

Y2 - 8 May 2005 through 12 May 2005

ER -