@article{72c5c7045e3e40eea36cd8b5222262fc,
title = "Inductively coupled plasma etching of GaN and its effect ton electrical characteristics.",
keywords = "ZX Int.klas.verslagjaar < 2002",
author = "B Rong and {van der Drift}, EWJM and RJ Reeves and WG Sloof and R Cheung",
note = "25% FCM, 75% DIMES",
year = "2001",
language = "Undefined/Unknown",
volume = "19",
pages = "2917--2920",
journal = "Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures",
issn = "1071-1023",
publisher = "AVS Science and Technology Society",
}