Influence of HSQ resist exposure temperature on ultra-high resolution electron beam lithography

VA Sidorkin, EWJM van der Drift, HWM Salemink

Research output: Contribution to journalArticleScientificpeer-review

13 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)2049-2053
Number of pages5
JournalJournal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume26
Publication statusPublished - 2008

Keywords

  • CWTS 0.75 <= JFIS < 2.00

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