@article{d945188988e74562905b9b404a2d13d5,
title = "Influence of HSQ resist exposure temperature on ultra-high resolution electron beam lithography",
keywords = "CWTS 0.75 <= JFIS < 2.00",
author = "VA Sidorkin and {van der Drift}, EWJM and HWM Salemink",
year = "2008",
language = "Undefined/Unknown",
volume = "26",
pages = "2049--2053",
journal = "Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures",
issn = "1071-1023",
publisher = "AVS Science and Technology Society",
}