Abstract
Hydrogenated amorphous silicon (a-Si:H) films are grown at different hydrogen dilutions. For high dilutions we observe a discrepancy in the surface roughness analysis between real-time spectroscopic ellipsometry (RTSE) and atomic force microscopy (AFM) measurements. With RTSE a much higher roughness layer thickness is measured than with AFM. Additionally we observe what appears to be a strong roughening phase in the first 30-50 nm of film growth for all conditions. A mechanism that involves the formations of a hydrogenrich overlayer and etching of higher hydrides in this overlayer is suggested.
Original language | English |
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Pages (from-to) | 571-574 |
Number of pages | 4 |
Journal | Physica Status Solidi. C: Current Topics in Solid State Physics |
Volume | 7 |
Issue number | 3-4 |
DOIs | |
Publication status | Published - 2010 |
Keywords
- professional journal papers
- Vakpubl., Overig wet. > 3 pag