Influence of SiH2Cl2 on the kinetics of chemical vapor deposition of tungsten by SiH4 reduction of WF6.

JF Jongste, TGM Oosterlaken, GCAM Janssen, S Radelaar

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	167-169
Number of pages	3
Journal	Electrochemical Society. Journal
Volume	146
Publication status	Published - 1999

Cite this

@article{69214b0d0c2a4090b78b4e939f0e16aa,

title = "Influence of SiH2Cl2 on the kinetics of chemical vapor deposition of tungsten by SiH4 reduction of WF6.",

author = "JF Jongste and TGM Oosterlaken and GCAM Janssen and S Radelaar",

year = "1999",

language = "Undefined/Unknown",

volume = "146",

pages = "167--169",

journal = "Electrochemical Society. Journal",

issn = "0013-4651",

publisher = "Electrochemical Society, Inc.",

}