Influence of the development process on ultimate resolution electron beam lithography using ultrathin hydrogen silsesquioxane resist layers

Research output: Contribution to journalArticleScientificpeer-review

22 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)1998-2003
Number of pages6
JournalJournal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume25
Issue number6
Publication statusPublished - 2007

Keywords

  • academic journal papers
  • CWTS 0.75 <= JFIS < 2.00

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