Influence of the development process on ultimate resolution electron beam lithography using ultrathin hydrogen silsesquioxane resist layers

AE Grigorescu; MC van der Krogt; CW Hagen; P Kruit

Influence of the development process on ultimate resolution electron beam lithography using ultrathin hydrogen silsesquioxane resist layers

AE Grigorescu, MC van der Krogt, CW Hagen, P Kruit

QN/Kavli Nanolab Delft

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	1998-2003
Number of pages	6
Journal	Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume	25
Issue number	6
Publication status	Published - 2007

Keywords

academic journal papers
CWTS 0.75 <= JFIS < 2.00

Cite this

@article{4e6c5064a750402ba4ad6e5ebc405e90,

title = "Influence of the development process on ultimate resolution electron beam lithography using ultrathin hydrogen silsesquioxane resist layers",

keywords = "academic journal papers, CWTS 0.75 <= JFIS < 2.00",

author = "AE Grigorescu and {van der Krogt}, MC and CW Hagen and P Kruit",

year = "2007",

language = "Undefined/Unknown",

volume = "25",

pages = "1998--2003",

journal = "Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "6",

}

Influence of the development process on ultimate resolution electron beam lithography using ultrathin hydrogen silsesquioxane resist layers. / Grigorescu, AE; van der Krogt, MC ; Hagen, CW et al.
In: Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures, Vol. 25, No. 6, 2007, p. 1998-2003.

Research output: Contribution to journal › Article › Scientific › peer-review

TY - JOUR

T1 - Influence of the development process on ultimate resolution electron beam lithography using ultrathin hydrogen silsesquioxane resist layers

AU - Grigorescu, AE

AU - van der Krogt, MC

AU - Hagen, CW

AU - Kruit, P

PY - 2007

Y1 - 2007

KW - academic journal papers

KW - CWTS 0.75 <= JFIS < 2.00

M3 - Article

SN - 1071-1023

VL - 25

SP - 1998

EP - 2003

JO - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

IS - 6

ER -