Inspection apparatus for lithography

JM Kuiper (Inventor)

Research output: Patent

Original languageEnglish
Patent numberUS 2010/0302521 A1
IPCaangevraagd door ASML NL, Veldhoven (NL)
Priority date2/12/10
Publication statusPublished - 2010

Keywords

  • Octrooi
  • Geen VSNU-classificatie

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