Interactive effects in reactive ion etching of W1-xGex

EWJM van der Drift, BQ Dinh, PA Verhoeven, EJM Fakkeldij, T Zijlstra

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	2676-2681
Number of pages	6
Journal	Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume	15
Publication status	Published - 1997

Cite this

@article{1701a643e3054bb688cb286fdbab4327,

title = "Interactive effects in reactive ion etching of W1-xGex",

author = "{van der Drift}, EWJM and BQ Dinh and PA Verhoeven and EJM Fakkeldij and T Zijlstra",

year = "1997",

language = "Undefined/Unknown",

volume = "15",

pages = "2676--2681",

journal = "Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

}

TY - JOUR

T1 - Interactive effects in reactive ion etching of W1-xGex

AU - van der Drift, EWJM

AU - Dinh, BQ

AU - Verhoeven, PA

AU - Fakkeldij, EJM

AU - Zijlstra, T

PY - 1997

Y1 - 1997

M3 - Article

SN - 1071-1023

VL - 15

SP - 2676

EP - 2681

JO - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

ER -