Inverse Electromagnetics for EUV mask metrology and inspection

P. Ansuinelli

Research output: ThesisDissertation (TU Delft)

57 Downloads (Pure)

Abstract

The importance of inverse problems is paramount in science and physics because their solution provides information about parameters that cannot be directly observed. This thesis discusses and details the application of a few inverse methods in optical imaging, metrology and inspection of lithographic targets, particularly patterned structures on top of an extreme ultraviolet (EUV) lithographic mask...
Original languageEnglish
Awarding Institution
  • Delft University of Technology
Supervisors/Advisors
  • Coene, W.M.J.M., Supervisor
  • Urbach, H.P., Supervisor
Award date9 Mar 2022
Print ISBNs9789464237009
DOIs
Publication statusPublished - 2022

Keywords

  • inverse problems
  • scatterometry
  • phase retrieval
  • EUV mask inspection and metrology

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