Abstract
The importance of inverse problems is paramount in science and physics because their solution provides information about parameters that cannot be directly observed. This thesis discusses and details the application of a few inverse methods in optical imaging, metrology and inspection of lithographic targets, particularly patterned structures on top of an extreme ultraviolet (EUV) lithographic mask...
Original language | English |
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Awarding Institution |
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Supervisors/Advisors |
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Award date | 9 Mar 2022 |
Print ISBNs | 9789464237009 |
DOIs | |
Publication status | Published - 2022 |
Keywords
- inverse problems
- scatterometry
- phase retrieval
- EUV mask inspection and metrology