Investigating the lateral motion of SiGe islands by selective chemical etching

G Katsaros, A Rastelli, M Stoffel, G Isella, H von Kanel, AM Bittner, J Tersoff, U Denker, OG Schmidt, G Costantini, K Kern

Research output: Contribution to journalArticleScientificpeer-review

48 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)2606-2611
Number of pages6
JournalSurface Science
Volume600
Issue number12
Publication statusPublished - 2006

Keywords

  • academic journal papers
  • Geen BTA classificatie

Cite this

Katsaros, G., Rastelli, A., Stoffel, M., Isella, G., von Kanel, H., Bittner, AM., Tersoff, J., Denker, U., Schmidt, OG., Costantini, G., & Kern, K. (2006). Investigating the lateral motion of SiGe islands by selective chemical etching. Surface Science, 600(12), 2606-2611.