Investigation and characterization of silicon nitride thin films deposited by ECR-CVD plasma for Microelectromechanical systems application

C Biasotto, JA Diniz, AM Daltrini, SA Moshkalyov, MJR Monteiro

Research output: Contribution to journalArticleScientificpeer-review

Original languageUndefined/Unknown
JournalThin Solid Films
Publication statusPublished - 2007

Bibliographical note

Niet eerder gehonoreerd


  • Elektrotechniek
  • Techniek
  • academic journal papers
  • CWTS 0.75 <= JFIS < 2.00

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