Investigation of hydrogen silsesquioxane E-beam resist as etching mask for cryogenic silicon etching

CK Yang; G Pandraud; K Babaei Gavan; EWJM van der Drift; PJ French

Investigation of hydrogen silsesquioxane E-beam resist as etching mask for cryogenic silicon etching

CK Yang, G Pandraud, K Babaei Gavan, EWJM van der Drift, PJ French

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific

Original language	Undefined/Unknown
Title of host publication	Proceedings of APCTP-ASEAN workshop on Advanced Material Science and Nanotechnology
Editors	s.n.
Place of Publication	Nha trang, Vietnam
Publisher	APCTP-ASEAN
Pages	1088-1092
Number of pages	5
ISBN (Print)	978-90-9023470
Publication status	Published - 2008
Event	APCTP-ASEAN workshop on Advanced material science and nanotechnology - Nha trang, Vietnam Duration: 15 Sept 2008 → 21 Sept 2008

Publication series

Name
Publisher	APCTP-ASEAN

Conference

Conference	APCTP-ASEAN workshop on Advanced material science and nanotechnology
Period	15/09/08 → 21/09/08

Keywords

conference contrib. refereed
Conf.proc. > 3 pag

Cite this

@inproceedings{328253cbdebc4905a8d340a1440fe2ac,

title = "Investigation of hydrogen silsesquioxane E-beam resist as etching mask for cryogenic silicon etching",

keywords = "conference contrib. refereed, Conf.proc. > 3 pag",

author = "CK Yang and G Pandraud and {Babaei Gavan}, K and {van der Drift}, EWJM and PJ French",

year = "2008",

language = "Undefined/Unknown",

isbn = "978-90-9023470",

publisher = "APCTP-ASEAN",

pages = "1088--1092",

editor = "s.n.",

booktitle = "Proceedings of APCTP-ASEAN workshop on Advanced Material Science and Nanotechnology",

note = "APCTP-ASEAN workshop on Advanced material science and nanotechnology ; Conference date: 15-09-2008 Through 21-09-2008",

}

Yang, CK, Pandraud, G, Babaei Gavan, K, van der Drift, EWJM & French, PJ 2008, Investigation of hydrogen silsesquioxane E-beam resist as etching mask for cryogenic silicon etching. in s.n. (ed.), Proceedings of APCTP-ASEAN workshop on Advanced Material Science and Nanotechnology. APCTP-ASEAN, Nha trang, Vietnam, pp. 1088-1092, APCTP-ASEAN workshop on Advanced material science and nanotechnology, 15/09/08.

Investigation of hydrogen silsesquioxane E-beam resist as etching mask for cryogenic silicon etching. / Yang, CK; Pandraud, G; Babaei Gavan, K et al.
Proceedings of APCTP-ASEAN workshop on Advanced Material Science and Nanotechnology. ed. / s.n. Nha trang, Vietnam: APCTP-ASEAN, 2008. p. 1088-1092.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific

TY - GEN

T1 - Investigation of hydrogen silsesquioxane E-beam resist as etching mask for cryogenic silicon etching

AU - Yang, CK

AU - Pandraud, G

AU - Babaei Gavan, K

AU - van der Drift, EWJM

AU - French, PJ

PY - 2008

Y1 - 2008

KW - conference contrib. refereed

KW - Conf.proc. > 3 pag

M3 - Conference contribution

SN - 978-90-9023470

SP - 1088

EP - 1092

BT - Proceedings of APCTP-ASEAN workshop on Advanced Material Science and Nanotechnology

A2 - s.n., null

PB - APCTP-ASEAN

CY - Nha trang, Vietnam

T2 - APCTP-ASEAN workshop on Advanced material science and nanotechnology

Y2 - 15 September 2008 through 21 September 2008

ER -