Investigation of hydrogen silsesquioxane E-beam resist as etching mask for cryogenic silicon etching

CK Yang, G Pandraud, K Babaei Gavan, EWJM van der Drift, PJ French

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

Original languageUndefined/Unknown
Title of host publicationProceedings of APCTP-ASEAN workshop on Advanced Material Science and Nanotechnology
Editors s.n.
Place of PublicationNha trang, Vietnam
PublisherAPCTP-ASEAN
Pages1088-1092
Number of pages5
ISBN (Print)978-90-9023470
Publication statusPublished - 2008
EventAPCTP-ASEAN workshop on Advanced material science and nanotechnology - Nha trang, Vietnam
Duration: 15 Sep 200821 Sep 2008

Publication series

Name
PublisherAPCTP-ASEAN

Conference

ConferenceAPCTP-ASEAN workshop on Advanced material science and nanotechnology
Period15/09/0821/09/08

Keywords

  • conference contrib. refereed
  • Conf.proc. > 3 pag

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