Isothermal stress relaxation in Al, AlCu and AlVPd films

JP Lokker; JF Jongste; GCAM Janssen; S Radelaar

Isothermal stress relaxation in Al, AlCu and AlVPd films

JP Lokker, JF Jongste, GCAM Janssen, S Radelaar

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific

Original language	Undefined/Unknown
Title of host publication	Advanced Metallization and Interconnect Systems for ULSI Applications in 1995
Editors	RC Ellwanger, Shi-Qing Wang
Place of Publication	Pittsburgh
Publisher	Materials Research Society
Pages	513-516
Number of pages	4
Publication status	Published - 1996
Event	Advanced Metallization and Interconnect Systems for ULSI Applications in 1995 - Pittsburgh Duration: 3 Oct 1996 → 5 Oct 1996

Publication series

Name
Publisher	Materials Research Society

Conference

Conference	Advanced Metallization and Interconnect Systems for ULSI Applications in 1995
Period	3/10/96 → 5/10/96

Cite this

@inproceedings{6c4d475286784a679c6362bcda0e3123,

title = "Isothermal stress relaxation in Al, AlCu and AlVPd films",

author = "JP Lokker and JF Jongste and GCAM Janssen and S Radelaar",

year = "1996",

language = "Undefined/Unknown",

publisher = "Materials Research Society",

pages = "513--516",

editor = "RC Ellwanger and {Shi-Qing Wang}",

booktitle = "Advanced Metallization and Interconnect Systems for ULSI Applications in 1995",

address = "United States",

note = "Advanced Metallization and Interconnect Systems for ULSI Applications in 1995 ; Conference date: 03-10-1996 Through 05-10-1996",

}

Lokker, JP, Jongste, JF, Janssen, GCAM & Radelaar, S 1996, Isothermal stress relaxation in Al, AlCu and AlVPd films. in RC Ellwanger & Shi-Qing Wang (eds), Advanced Metallization and Interconnect Systems for ULSI Applications in 1995. Materials Research Society, Pittsburgh, pp. 513-516, Advanced Metallization and Interconnect Systems for ULSI Applications in 1995, 3/10/96.

Isothermal stress relaxation in Al, AlCu and AlVPd films. / Lokker, JP; Jongste, JF; Janssen, GCAM et al.
Advanced Metallization and Interconnect Systems for ULSI Applications in 1995. ed. / RC Ellwanger; Shi-Qing Wang. Pittsburgh: Materials Research Society, 1996. p. 513-516.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific

TY - GEN

T1 - Isothermal stress relaxation in Al, AlCu and AlVPd films

AU - Lokker, JP

AU - Jongste, JF

AU - Janssen, GCAM

AU - Radelaar, S

PY - 1996

Y1 - 1996

M3 - Conference contribution

SP - 513

EP - 516

BT - Advanced Metallization and Interconnect Systems for ULSI Applications in 1995

A2 - Ellwanger, RC

A2 - Shi-Qing Wang, null

PB - Materials Research Society

CY - Pittsburgh

T2 - Advanced Metallization and Interconnect Systems for ULSI Applications in 1995

Y2 - 3 October 1996 through 5 October 1996

ER -