@inproceedings{3a11369fd1664275b286a166d768cf3f,
title = "Kinetics and crystal orientation dependence in high aspect ratio silicon dry etching.",
keywords = "ZX Int.klas.verslagjaar < 2002",
author = "MA Blauw and T Zijlstra and RA Bakker and {van der Drift}, EWJM",
year = "2000",
language = "Undefined/Unknown",
isbn = "1-56396-969-6",
pages = "3453--3461",
editor = "J Melngailis",
booktitle = "Proceedings of the 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofrabrication.",
}