Kinetics and crystal orientation dependence in high aspect ratio silicon dry etching.

MA Blauw, T Zijlstra, RA Bakker, EWJM van der Drift

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

47 Citations (Scopus)
Original languageUndefined/Unknown
Title of host publicationProceedings of the 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofrabrication.
EditorsJ Melngailis
Pages3453-3461
Number of pages9
Publication statusPublished - 2000

Keywords

  • ZX Int.klas.verslagjaar < 2002

Cite this