Kinetics of copper chemical vapour deposition from Cu(hfac)VTMS

MLH ter Heerdt; PJ van der Put; EM Kelder; J Schoonman

Kinetics of copper chemical vapour deposition from Cu(hfac)VTMS

MLH ter Heerdt, PJ van der Put, EM Kelder, J Schoonman

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific

Original language	Undefined/Unknown
Title of host publication	Fundamental Gas-Phase and Surface Chemistry of Vapor-Phase Materials Synthesis
Editors	TJ Mountziaris, MD Allendorf, KF Jensen, RK Ulrich, MR Zachariah, M Meyyappan
Place of Publication	Pennington (NJ) USA
Publisher	The Electrochemical Society, Inc.
Pages	301-306
Number of pages	6
Publication status	Published - 1999
Event	Boston (MZ) USA - Pennington (NJ) USA Duration: 1 Nov 1999 → 6 Nov 1999

Publication series

Name
Publisher	The Electrochemical Society Inc.

Conference

Conference	Boston (MZ) USA
Period	1/11/99 → 6/11/99

Cite this

ter Heerdt, MLH ; van der Put, PJ ; Kelder, EM ; Schoonman, J. / Kinetics of copper chemical vapour deposition from Cu(hfac)VTMS. Fundamental Gas-Phase and Surface Chemistry of Vapor-Phase Materials Synthesis. editor / TJ Mountziaris ; MD Allendorf ; KF Jensen ; RK Ulrich ; MR Zachariah ; M Meyyappan. Pennington (NJ) USA : The Electrochemical Society, Inc., 1999. pp. 301-306

@inproceedings{02fa7bfa5aba427d8a146cfcb83a89d8,

title = "Kinetics of copper chemical vapour deposition from Cu(hfac)VTMS",

author = "{ter Heerdt}, MLH and {van der Put}, PJ and EM Kelder and J Schoonman",

year = "1999",

language = "Undefined/Unknown",

publisher = "The Electrochemical Society, Inc.",

pages = "301--306",

editor = "TJ Mountziaris and MD Allendorf and KF Jensen and RK Ulrich and MR Zachariah and M Meyyappan",

booktitle = "Fundamental Gas-Phase and Surface Chemistry of Vapor-Phase Materials Synthesis",

note = "null ; Conference date: 01-11-1999 Through 06-11-1999",

}

ter Heerdt, MLH, van der Put, PJ, Kelder, EM & Schoonman, J 1999, Kinetics of copper chemical vapour deposition from Cu(hfac)VTMS. in TJ Mountziaris, MD Allendorf, KF Jensen, RK Ulrich, MR Zachariah & M Meyyappan (eds), Fundamental Gas-Phase and Surface Chemistry of Vapor-Phase Materials Synthesis. The Electrochemical Society, Inc., Pennington (NJ) USA, pp. 301-306, Boston (MZ) USA, 1/11/99.

Kinetics of copper chemical vapour deposition from Cu(hfac)VTMS. / ter Heerdt, MLH; van der Put, PJ; Kelder, EM; Schoonman, J.

Fundamental Gas-Phase and Surface Chemistry of Vapor-Phase Materials Synthesis. ed. / TJ Mountziaris; MD Allendorf; KF Jensen; RK Ulrich; MR Zachariah; M Meyyappan. Pennington (NJ) USA : The Electrochemical Society, Inc., 1999. p. 301-306.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific

TY - GEN

T1 - Kinetics of copper chemical vapour deposition from Cu(hfac)VTMS

AU - ter Heerdt, MLH

AU - van der Put, PJ

AU - Kelder, EM

AU - Schoonman, J

PY - 1999

Y1 - 1999

M3 - Conference contribution

SP - 301

EP - 306

BT - Fundamental Gas-Phase and Surface Chemistry of Vapor-Phase Materials Synthesis

A2 - Mountziaris, TJ

A2 - Allendorf, MD

A2 - Jensen, KF

A2 - Ulrich, RK

A2 - Zachariah, MR

A2 - Meyyappan, M

PB - The Electrochemical Society, Inc.

CY - Pennington (NJ) USA

Y2 - 1 November 1999 through 6 November 1999

ER -